Photosensitive polyimide resin architecture: AjinomotoRecent Research Landscape
Uncontrolled solubility rates in lithographic patterning lead to poor resolution and yield loss. These formulations engineer the chemical dissolution switch to ensure high-fidelity circuit reproduction.
What technical problems is Ajinomoto addressing in Photosensitive polyimide resin architecture?
Substrate warpage and dielectric loss
(18)evidences
Delamination between the photosensitive resin and the supporting substrate or wiring board during processing. Preventing separation ensures structural integrity and reliability in high-density semiconductor packaging.
Optical signal transmission loss
(7)evidences
Variations in chemical stability and component ratios during multi-step processing lead to poor reproducibility. Standardizing the delivery through kits prevents premature degradation and ensures uniform film properties.