Low signal-to-noise ratios and particle loss during storage prevent precise measurement of charged particles. Resolving this allows for higher analytical sensitivity and more reliable mass spectrometry data.

Overlapping ion signals and chemical noise prevent the accurate identification of target analytes. Reducing this interference ensures high-resolution mass measurement and precise quantification.

Uncontrolled ion trajectories and fluctuating charge densities lead to beam divergence and substrate damage. Stabilizing these parameters ensures precision in high-vacuum manufacturing processes.