Merck

Last updated January 31, 2026

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Silazane siloxane copolymer precursor chemistry: MerckRecent Research Landscape

Instability in thin-film deposition leads to non-uniform amorphous silicon layers, which is mitigated through the structural engineering of crosslinked polysilazanes and block copolymers. Precise control over the polymer backbone ensures consistent thermal conversion and film density.

What technical problems is Merck addressing in Silazane siloxane copolymer precursor chemistry?

Poor interfacial adhesion

(16)evidences

Standard siloxane polymers undergo rapid degradation and loss of mechanical integrity at high temperatures. Improving thermal resistance prevents material failure in extreme environments.

Inconsistent thin film uniformity

(14)evidences

Structural non-uniformity and porosity in silica layers lead to mechanical failure and poor barrier properties. Achieving high-density films ensures structural integrity and chemical resistance in microelectronic applications.