The scaling of high-k dielectric materials for advanced semiconductor devices faces several challenges. As the gate oxide thickness decreases, the leakage current through the dielectric increases, leading to higher power consumption and reliability issues. Finding high-k materials with suitable band offsets, thermal stability, and compatibility with the semiconductor channel material is a significant obstacle. Additionally, the integration of these materials into the manufacturing process while maintaining high-quality interfaces and minimizing defects remains a complex task.
We’ve curated applications and patents from the semiconductor industry over the past three years. Following an auto-landscape analysis, we’ve distilled the following insights. Because of the lag in time between patent filing and publication of the related application (on
average 18 months), this report does not give a complete picture but rather a perspective on
publicly available semiconductor-related patent information up until February 2024.
Summary
Changxin Memory Technologies’s presence among the top assignees is surprising because it is a relatively lesser-known company compared to industry giants like Samsung and TSMC. This could indicate the company’s strong focus and investment in research and development, particularly in the memory technology domain.
Who are the top companies working on high-k dielectric scaling materials in semiconductors?
| Companies | Patent Count |
| Samsung Electronics Co Ltd | 37 |
| Taiwan Semiconductor Manufacturing Co TSMC Ltd | 30 |
| Changxin Memory Technologies Inc | 13 |
Who is collaborating in high-k dielectric scaling materials in semiconductors?
| Companies | Count |
| Toshiba Corp & Toshiba Electronic Devices and Storage Corp | 3 |
| Denso Corp & Kochi Prefectural University Corp & Mirise Technologies Corp & Toyota Motor Corp | 2 |
| EMD Performance Materials Corp & Merck Patent GmbH & North Carolina State University | 1 |
| Industry University Cooperation Foundation IUCF HYU & LG Display Co Ltd | 1 |
| DNF Co Ltd & Samsung Electronics Co Ltd | 1 |
Who are the top inventors that are working on high-k dielectric scaling materials in semiconductors?
| Inventors | Patent count |
| Jooho Lee | 10 |
| Chi On Chui | 7 |
| Yongsung Kim | 7 |
What are the filing trends of high-k dielectric scaling materials in semiconductors?
| Year | Patent count |
| 2021 | 54 |
| 2022 | 103 |
| 2023 | 18 |
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